The European Union has launched NanoIC, its largest and most advanced semiconductor pilot line, at the imec research hub. Marking a pivotal moment in the continent’s race for technological sovereignty, the project represents a €2.5 billion investment, funded by a partnership between the EU (€700 million), national and regional governments (€700 million), and private industry leaders, including ASML.
The facility was officially opened on February 9, 2026, by European Executive Vice-President Henna Virkkunen, Belgian Prime Minister Bart De Wever, and Flemish Minister-President Matthias Diependaele.
NanoIC is the first facility in Europe to house the world’s most advanced Extreme Ultraviolet (EUV) lithography equipment, specifically designed to prototype chips beyond the 2nm node. By providing a “lab to fab” bridge, the facility allows startups, SMEs, and global researchers to test cutting-edge designs at a near-industrial scale before committing to the massive costs of mass production.
